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Publikasi

Journal Articles and Books(from the latest one)

  1. T. Akahane, T. Komori, J. Liu, M. Huda, Zulfakri Bin Mohamad, Y. Yin, and S. Hosaka: “Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)”, Key Engineering Materials AMDE  (2012)  (inpress)
  2. M. Huda, J. Liu, Y. Yin, and S. Hosaka: “Fabrication of 5-nm-sized Nanodots using Self-Assemble of Polystyrene-Poly(Dimethyl Siloxane)”, Jpn. J. Appl. Phys. (inpress)
  3. M. Huda, T. Tamura, Y. Yin, and S. Hosaka: “Formation of 12-nm Nanodot Pattern by Diblock Copolymer Self-Assembly Technique”, Key Engineering Materials AMDE,Vol. 497, (2012) p. 122.
  4. T. Akahane, M. Huda, T. Tamura, Y. Yin, and S. Hosaka: “Guide Pattern Functionalization for Regularly Arranged PS-PDMS Self-Assembled Nanodot Pattern by Brush Processing”, Key Engineering Materials AMDE , Vol. 497, (2012) p. 116.
  5. M. Huda, Y. Yin, and S. Hosaka: “Self-Assembled Nanodot Fabrication by Using PS-PDMS block Copolymer”, Quantum Dots, Ameenah Al-Ahmadi (Ed.), (December 2011) InTech, ISBN 979-953-307-308-7, (inpress).
  6. M. Huda, Y. Yin, and S. Hosaka: “Formation of 13-nm-Pitch Block Copolymer Self-Assembled Nanodots Pattern for High-Density Magnetic Recording”, AIP Con. Proc. Vol. 1415 (2011) p. 79-82.
  7. S. Hosaka, T. Akabane, M. Huda, T. Tamura, and Y. Yin: “Long-range-ordering of nanodot arrays using self-assembly and post and line mixing templates”, AIP Con. Proc. Vol. 1415 (2011) p. 102-106.
  8. M. Huda, T. Akahane, T. Tamura, Y. Yin, and S. Hosaka: “Fabrication of 10-nm Block Copolymer Self-Assembled Nanodots for Ultrahigh-Density Magnetic Recording” Jpn. J. Appl. Phys. Vol. 50 (2011), p. 06GG06 1-5.
  9. T. Akahane, M. Huda, T. Tamura, Y. Yin, and S. Hosaka: “Orientation-Controlled and Long-Range-Ordering Self-Assembled Nanodot Array for Ultrahigh-Density Bit Patterned Media”, Jpn. J. Appl. Phys. Vol. 50 (2011) p. 06GG04 1-4.
  10. S. Hosaka, T. Akahane, M. Huda, T. Tamura, Y. Yin, N. Kihara, Y. Kamata, and A. Kikitsu: “Long-range-ordering of self-assembled block copolymer nanodots using EB-drawn guide line and post mixing template”, Microelectron. Eng., Vol. 88 (2011) p. 2571-2575.
  11. M. Huda, Y. Yin, and S. Hosaka: “Self-Assembled Nanodot Fabrication by Using Diblock Copolymer”, Key Engineering Materials AMDE Vol. 459, (2010) p. 120.
  12. T. Akahane, M. Huda, Y. Yin, and S. Hosaka: “Guide Pattern for Long-Range-Order Nanofabrication of Self-Assembled Block Copolymers”, Key Engineering Materials AMDE Vol. 459, (2010) p. 124.

Presentations in Conferences

  1. T. Akahane, M. Huda, Z. Bin Mohamad, Y. Yin, and S. Hosaka: “Improved Observation Contrast of Block Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)”, 3st International Conference on Advanced Micro-Device Engineering (AMDE), Gunma, Japan (Dec. 2011)
  2. M. Huda, J. Liu, Y. Yin, S. Hosaka: “Fabrication of 6-nm Block Copolymer Self-Assembled Nanodots for Ultrahigh-Density Magnetic Recording“, 24rd International Microprocesses and Nanotechnology Conference, Kyoto, Japan (Oct. 2011)
  3. M. Huda, Y. Yin and S. Hosaka: “Formation of 13-nm-Pitch Block Copolymer Self-Assembled Nanodots Pattern for High-Density Magnetic Recording”, The 4th Nanoscience & Nanotechnology Symposium, Nusa Dua, Bali, Indonesia (Sep. 2011).
  4. S. Hosaka, T. Akabane, M. Huda, T. Tamura, and Y. Yin: “Long-range-ordering of nanodot arrays using self-assembly and post and line mixing templates”, The 4th Nanoscience & Nanotechnology Symposium, Nusa Dua, Bali, Indonesia (Sep. 2011).
  5. Y. Yin, M. Huda, T. Akahane, and S. Hosaka: “Diblock Copolymer Self-Assembled Nanodots for Next-Generation Magnetic Recording”, the International Conference on Nanoscience and Technology, China 2011 (ChinaNANO 2011), Beijing, China (Sep. 2011).
  6. M. Huda, T. Tamura, Y. Yin, and S. Hosaka: “Formation of 12-nm Nanodot Pattern by Diblock Copolymer Self-Assembly Technique”, 2nd International Conference on Advanced Micro-Device Engineering (AMDE), Gunma, Japan (Dec. 2010).
  7. T. Akahane, M. Huda, T. Tamura, Y. Yin, and S. Hosaka: “Guide Pattern Functionalization for Regularly Arranged PS-PDMS Self-Assembled Nanodot Pattern by Brush Processing”, 2nd International Conference on Advanced Micro-Device Engineering (AMDE), Gunma, Japan (Dec. 2010).
  8. T. Tamura, H. Zhang, T. Akahane, M. Huda, T. Komori, Y. Yin,and S. Hosaka: “Fabrication of Nanometer Sized Si Dot Arrays Using Reactive Ion Etching with Metal Dot Arrays”, 2nd International Conference on Advanced Micro-Device Engineering (AMDE), Gunma, Japan (Dec. 2010).
  9. M. Huda, T. Akahane, T. Tamura, Y. Yin, and S. Hosaka: “Fabrication of 10-nm Block Copolymer Self-Assembled Nanodots for Ultrahigh-Density Magnetic Recording”, 23rd International Microprocesses and Nanotechnology Conference, Fukuoka, Japan (Nov. 2010).
  10. T. Akahane, M. Huda, T. Tamura, Y. Yin, and S. Hosaka: “Orientation-Controlled and Long-Range-Ordering Self-Assembled Nanodot Array for Ultrahigh-Density Bit Patterned Media”, 23rd International Microprocesses and Nanotechnology Conference, Fukuoka, Japan (Nov. 2010).
  11. S. Hosaka, T. Akabane, M. Huda, T. Tamura, and Y. Yin: “Long-range-ordering of nanodot arrays using self- assembled block copolymers with EB drawn guide post and line mixing templates”, 36th International Conference on Micro & Nano Engineering (MNE), Genoa, Italy (Sept. 2010).
  12. M. Huda, T. Akahane, T. Tamura, Y. Yin, and S. Hosaka: “Fabrication of 10-nm Block Copolymer Self-Assembled Nanodots for High-Density Magnetic Recording”, the 18th Indonesian Scientific Meeting, Nagoya, Japan (Aug. 2010).
  13. ミフタフル フダ，赤羽  隆志，田村 拓郎，尹 友，保坂 純男，木原 直子，鎌田 芳幸，喜々津 哲: “高密度磁気記録のためのブロック共重合体による自己組織化10nmナノドット形成”, 2010年秋季 第71回 応用物理学会学術講演会（長崎大学）.
  14. 赤羽 隆志、ミフタフルフダ、田村 拓郎、尹 友、保坂 純男: “高密度パターンドメディアのための電子線描画ポスト格子とガイドラインによる自己組織化パターンの規則配列制御”, 2010年秋季 第71回 応用物理学会学術講演会（長崎大学）
  15. T. Akahane, M. Huda, Y. Yin, and S. Hosaka: “Guide Pattern for Long-Range-Order Nanofabrication of Self-Assembled Block Copolymers”, 1st International Conference on Advanced Micro-Device Engineering (AMDE), Gunma, Japan (Dec. 2009)
  16. M. Huda, Y. Yin, and S. Hosaka: “Self-Assembled Nanodot Fabrication by Using Diblock Copolymer”, 1st International Conference on Advanced Micro-Device Engineering (AMDE), Gunma, Japan (Dec. 2009)

Joint Researches

1. Toshiba (2010~)

The research is funded by the New Energy and Industrial Technology Development Organization (NEDO) under the development of nanobit technology for the ultrahigh density magnetic recording (Green IT) project.

2. Toyota (2009~2011)

The project was aimed to create and design the next generation of solar cell. We designed and proposed 3D quantum dot solar cell.

Scholarships and Fellowships

1. Monbukagakusho Scholarship, 2005-2008 & 2008-2010

2. Rotary Yoneyama Memorial Fellowship, 2010-2012

2. Tsuji Asia Scholarship, 2012-present

Awards

The Best Student of Master program for 2012 graduation of Graduate School of Engineering, Gunma University, etc.

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